193-nm laser ablation of CVD diamond and graphite in vacuum: plume analysis and film properties

被引:0
作者
R.J. Lade
F. Claeyssens
K.N. Rosser
M.N.R. Ashfold
机构
[1] School of Chemistry,
[2] University of Bristol,undefined
[3] Bristol BS8 1TS,undefined
[4] UK,undefined
来源
Applied Physics A | 1999年 / 69卷
关键词
PACS: 81.15.Fg; 79.20.DS; 68.55.-a;
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摘要
The pulsed laser ablation of chemical vapor deposition (CVD) diamond and graphite samples in vacuum has been investigated by the use of an ArF excimer laser operating at λ=193 nm. The composition and propagation of both ablation plumes has been probed via wavelength and spatially and temporally resolved measurements of the plume emission and found to be very similar. Electronically excited C atoms and C+ and C2+ ions are identified among the ablated material. Plume expansion velocities are estimated from time-gated imaging of specific C and C+ emissions. Langmuir probe measurements provide further insight into the propagation of the charged components in both ablation plumes. Diamond-like carbon (DLC) films grown by 193-nm laser ablation of both target materials on Si substrates maintained at room temperature have been investigated by laser Raman spectroscopy (325 nm and 488 nm excitation) and by both optical and scanning electron microscopy, and their field emission characteristics investigated. Again, similarities outweigh the differences, but DLC films grown from ablation of the diamond target appear to show steeper I/V dependencies once above the threshold voltage for field emission.
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页码:S935 / S939
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