Investigation into the correlation factor of substrate and multilayer film surfaces by atomic force microscopy

被引：0
|
作者：
J. V. Grishchenko
M. L. Zanaveskin
机构：
[1] NBIC Centre,National Research Centre “Kurchatov Institute”
来源：
Crystallography Reports | 2013年 / 58卷
关键词：
Atomic Force Microscopy; Power Spectral Density; Atomic Force Microscopy Image; Crystallography Report; Correlation Factor;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
A method for studying the correlations between substrate and film-coating profiles by atomic force microscopy, which makes it possible to calculate the correlation factor (a function of spatial frequency), has been developed. The spatial-frequency range in which the correlation factor can be reliably calculated is established. The method proposed is used to calculate the dependence of the correlation factor on spatial frequency for multilayer interference mirror elements.
引用
收藏
页码：493 / 497
页数：4
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