The effect of thermal treatment on the structure of tantalum oxide films grown on titanium

被引：0
|
作者：
V. A. Zhabrev
Yu. A. Bystrov
L. P. Efimenko
A. E. Komlev
V. G. Baryshnikov
A. A. Kolomiitsev
V. I. Shapovalov
机构：
[1] Russian Academy of Sciences,Institute of Silicate Chemistry
[2] St. Petersburg State Electrotechnical University,undefined
来源：
Technical Physics Letters | 2004年 / 30卷
关键词：
Oxide; Titanium; Crystallization; Dioxide; Rutile;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
We have studied amorphous films of tantalum oxide deposited onto titanium substrate by reactive magnetron sputtering. Subsequent annealing at temperatures above 600°C leads to crystallization with the formation of a β-Ta2O5 phase. Thermal treatment in air results in oxidation of the substrate with the formation of a rutile modification of titanium dioxide.
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页码：396 / 398
页数：2
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