Fabrication of Fresnel zone plates with high aspect ratio by soft X-ray lithography

被引：5
作者：
Longhua Liu
Gang Liu
Ying Xiong
Jie Chen
Chunlei Kang
Xinlong Huang
Yangchao Tian
机构：
[1] University of Science and Technology of China,National Synchrotron Radiation Laboratory
来源：
Microsystem Technologies | 2008年 / 14卷
关键词：
PMMA; High Aspect Ratio; Diffraction Efficiency; Zone Plate; MIBK;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
High focusing efficiency Fresnel zone plates for hard X-ray imaging is fabricated by electron beam lithography, soft X-ray lithography, and gold electroplating techniques. Using the electron beam lithography, Fresnel zone plates which has an outermost zone width of 100 nm and thickness of 250 nm has been fabricated. Fresnel zone plates with outermost zone width of 150 nm and thickness of 660 nm has been fabricated by using soft X-ray lithography.
引用
收藏
页码：1251 / 1255
页数：4
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