Effect of gamma radiation on optical and electrical properties of tellurium dioxide thin films

被引:0
作者
T. K. Maity
S. L. Sharma
机构
[1] Indian Institute of Technology,Department of Physics & Meteorology
来源
Bulletin of Materials Science | 2008年 / 31卷
关键词
Tellurium dioxide; thin films; optical bandgap; gamma radiation dose; dosimeter;
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学科分类号
摘要
Gamma radiation induced changes in the optical and electrical properties of tellurium dioxide (TeO2) thin films, prepared by thermal evaporation, have been studied in detail. The optical characterization of the as-deposited thin films and that of the thin films exposed to various levels of gamma radiation dose clearly show that the optical bandgap decreases with increase in the gamma radiation dose up to a certain dose. At gamma radiation doses above this value, however, the optical bandgap has been found to increase. On the other hand, the current vs voltage plots for the as-deposited thin films and those for the thin films exposed to various levels of gamma radiation dose show that the current increases with the gamma radiation dose up to a certain dose and that the value of this particular dose depends upon the thickness of the film. The current has, however, been found to decrease with further increase in gamma radiation dose. The observed changes in both the optical and electrical properties indicate that TeO2 thin films can be used as the real time gamma radiation dosimeter up to a certain dose, a quantity that depends upon the thickness of the film.
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页码:841 / 846
页数:5
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