Critical shear stress produced by interaction of edge dislocation with nanoscale inhomogeneity

被引：0

作者：

Q. H. Fang

J. M. Chen

Y. W. Liu

P. H. Wen

机构：

[1] Hunan International Economics University,Department of Mechanical Engineering

[2] University of London,Department of Engineering, Queen Mary

来源：

Bulletin of Materials Science | 2010年 / 33卷

关键词：

Edge dislocation; nanoscale inhomogeneity; interface stress;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

According to the Mott and Nabarro’s model, the contribution to the critical shear stress of the material caused by the interaction between edge dislocations and nanoscale cylindrical inhomogeneities with interface stresses is obtained. The influence of the radius and the volume fraction of the inhomogeneity as well as the interface stresses on the critical shear stress is investigated. The important result is that, if the interface stress is considered, a maximum of the contribution to the critical shear stress produced by this interaction may be obtained when the radius of the inhomogeneity reaches a critical value.

引用

页码：123 / 127

页数：4

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