Characterization of AlGaN/GaN and AlGaN/AlN/GaN HEMTs in terms of mobility and subthreshold slope

被引:0
作者
Santashraya Prasad
Amit Krishna Dwivedi
Aminul Islam
机构
[1] Birla Institute of Technology,
[2] Mesra,undefined
来源
Journal of Computational Electronics | 2016年 / 15卷
关键词
AlGaN/GaN; High-electron mobility transistor (HEMT); Spacer layer; Mobility; Subthreshold slope;
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学科分类号
摘要
This paper presents two structures of wide band gap high electron mobility transistor (HEMT). One structure is made-up of a stack of AlGaN layer over GaN layer. This structure is characterized by two-dimensional (2-D) electron gas layer formed at the interface of the AlGaN and GaN layers. The 2-D electron gas plays an important role in determining the carrier-mobility (μ)\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$(\upmu )$$\end{document} and hence drain-to-source current (IDS)\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$(I_\mathrm{DS})$$\end{document} of HEMT. The other structure introduces an AlN spacer layer between the AlGaN and GaN layers to improve these characteristics. This paper compares the output characteristics curves (IDS-VDS)\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$(I_\mathrm{DS}-V_\mathrm{DS})$$\end{document} and transconductance characteristics curves (IDS-VGS)\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$(I_\mathrm{DS}-V_\mathrm{GS})$$\end{document} obtained from simulations performed using Silvaco ATLASTM\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\hbox {ATLAS}^\mathrm{TM}$$\end{document}. The modified structure with spacer layer shows improvements in carrier-mobility and hence drain-to-source current. This paper estimates and compares the subthreshold slope (SS) of the two devices. AlGaN/AlN/GaN HEMT offers an SS of 80 mV/decade whereas AlGaN/GaN HEMT offers an SS of 95 mV/decade. Thus, an improvement in SS of about 18.75 % is achieved in AlGaN/AlN/GaN HEMT compared to AlGaN/GaN HEMT. HEMT with spacer layer also offers 10×\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\times $$\end{document} improvement in IDS\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$I_{DS}$$\end{document} as compared to HEMT without spacer layer. The proposed HEMTs achieve ≈\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\approx $$\end{document}3.19×\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\times $$\end{document} improvement in breakdown voltage, >\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$>$$\end{document}1.3×\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\times $$\end{document} improvement in SS compared to HEMTs previously proposed in the literature.
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页码:172 / 180
页数:8
相关论文
共 54 条
[11]  
Roberts JC(2011)High performance gate recessed AlGaN/AlN/GaN MOS HEMT with 73 power-added efficiency IEEE Electron Device 32 626-628
[12]  
Piner EL(2014)Modeling of sheet carrier density and microwave frequency characteristics in Spacer based AlGaN/AlN/GaN HEMT devices Solid-State Electron. 91 44-52
[13]  
Palacios T(2005)A quasi-two-dimensional charge transport model of AlGaN/GaN high electron mobility transistors (HEMTs) Physica E 28 491-499
[14]  
Then HW(2009)Drain current stability and controllability of threshold voltage and subthreshold current in a multi-mesa channel alGaN/GaN HEMT Jpn. J. Appl. Phys. 48 081002-254
[15]  
Binari SC(2014)RF-Noise modeling in advanced CMOS technologies IEEE Trans. Electron Device 61 245-459
[16]  
Sridharan S(2001)AlGaN/AlN/GaN high-power microwave HEMT IEEE Electron Device Lett. 22 457-1044
[17]  
Venkatachalam A(2001)Enhancement-mode Al 0.66 In 0.34 As/Ga 0.67 In 0.33 As metamorphic HEMT, modeling and measurements IEEE Trans. Electron Device 48 1037-1789
[18]  
Yoder PD(2001)Effect of polarization fields on transport properties in AlGaA/GaN heterostructures J. Appl. Phys. 89 1783-undefined
[19]  
Cabral PM(undefined)undefined undefined undefined undefined-undefined
[20]  
Pedro JC(undefined)undefined undefined undefined undefined-undefined