Correlation Between Mechanical Properties and Nanofriction of [Ti–Cr/Ti–Cr–N]n and [Ti–Al/Ti–Al–N]n Multilayers

被引:0
作者
L. Ipaz
H. Ruiz-Luna
F. J. Espinoza-Beltrán
G. Zambrano
机构
[1] Universidad del Valle,Thin Films Group, Physics Department
[2] Centro de Investigación y de Estudios Avanzados del I.P.N.,undefined
[3] Libramiento Norponiente No. 2000,undefined
来源
Tribology Letters | 2013年 / 49卷
关键词
Atomic force microscopy; Coefficient of friction; Co-sputtering;
D O I
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学科分类号
摘要
In this work, thin films deposited by pulsed DC magnetron sputtering of [Ti–Al/Ti–Al–N]n and [Ti–Cr/Ti–Cr–N]n multilayers of nanometric periods were analyzed by AFM in contact mode to measure values of lateral and normal forces. From these measurements, the coefficient of friction (COF) of these materials in contact with the AFM tip was calculated. Measurements were made with three types of silicon tips, diamond-coated, Pt–Cr-coated, and bare silicon. Significant differences between the tip materials in contact with the samples, which affected the COF, were observed. The effect of the environmental layer of water covering the surface sample and the tip appears as the most important factor affecting the tribology behavior of the tip-sample contact. For diamond-coated and bare silicon tips there is an additional adherence force increasing the normal load. But for tips platinum–chromium-coated there is a repulsive force due to this water layer, which behaves as a lubricant layer before a threshold load.
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页码:403 / 412
页数:9
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共 93 条
[1]  
Munz WD(1986)Titanium aluminum nitride films: a new alternative to TiN coatings J. Vac. Sci. Technol. A4 2717-2725
[2]  
Ikeda T(1991)Phase formation and characterization of hard coatings in the TiAlN system prepared by the cathodic arc ion plating method Thin Solid Films 195 99-110
[3]  
Satoh H(2007)The structural and tribological behaviors of CrN and Cr-Ti-N coatings Appl. Surf. Sci. 253 7353-7359
[4]  
Zhang GA(2007)Comparison of tribological behaviours of AlCrN and TiAlN coatings—deposited by physical vapor deposition Wear 263 1423-1429
[5]  
Yan PX(2010)Mechanical, tribological and electrochemical behavior of Cr Appl. Surf. Sci. 256 2380-2387
[6]  
Wang P(1987)Al J. Vac. Sci. Technol. A5 2173-2179
[7]  
Chen YM(2002)N coatings deposited by r.f. reactive magnetron co-sputtering method Thin Solid Films 406 159-163
[8]  
Zhang JY(1998)Industrial deposition of binary, ternary and quaternary nitrides of titanium, zirconium and aluminium Surf. Coat. Technol. 108 132-137
[9]  
Mo JL(2003)Effects of nitrogen flow rates on the growth morphology of TiAlN films prepared by an rf-reactive sputtering technique Mater. Sci. Eng., A 342 58-79
[10]  
Zhu MH(2000)Deposition and characterization of TiAlN and multi-layered TiN/TiAlN coatings using unbalanced magnetron sputtering Surf. Coat. Technol. 123 219-226