Surface passivation of germanium by atomic layer deposited Al2O3 nanolayers

被引：0
|
作者：
Wilhelmus J. H. Berghuis
Jimmy Melskens
Bart Macco
Roel J. Theeuwes
Marcel A. Verheijen
Wilhelmus M. M. Kessels
机构：
[1] Eindhoven University of Technology,
[2] Eurofins Materials Science BV,undefined
来源：
Journal of Materials Research | 2021年 / 36卷
关键词：
Atomic layer deposition; Surface passivation; Germanium; Aluminium oxide; Al; O; Fixed charge density;
D O I：
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中图分类号：
学科分类号：
摘要：
引用
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页码：571 / 581
页数：10
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