Probing induced defects in individual carbon nanotubes using electrostatic force microscopy

被引:0
|
作者
T. Sand Jespersen
J. Nygård
机构
[1] University of Copenhagen,Niels Bohr Institute, Nano
来源
Applied Physics A | 2007年 / 88卷
关键词
Single Wall Carbon Nanotubes; Plasma Etch; Topographic Data; Electrostatic Force Microscopy; Oxygen Plasma Etch;
D O I
暂无
中图分类号
学科分类号
摘要
Structural defects greatly affect the electronic properties of single wall carbon nanotubes (CNT’s), for instance by increasing the sensitivity to their environment; an effect which can be utilized for better performance of CNT based chemical sensors. Here we show that electrostatic force microscopy (EFM) can be used as a non-invasive technique for probing defects in individual CNT’s supported on insulating substrates. The technique is demonstrated by monitoring the change in EFM signal upon intentionally inducing defect by an oxygen plasma etch, and is applied to assess the quality of as-grown CNT samples and to study the effect of exposing CNT’s to the low energy electron irradiation of a scanning electron microscope (SEM).
引用
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页码:309 / 313
页数:4
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