Preparation of CulnSe2 thin films by rapid thermal processing of Se-containing precursors

被引:0
作者
V. Alberts
M. Chenene
O. Schenker
E. Bucher
机构
[1] Rand Afrikaans University,Department of Physics
[2] Rand Afrikaans University,Department of Physics
[3] University of Konstanz,Faculty of Physics
来源
Journal of Materials Science: Materials in Electronics | 2000年 / 11卷
关键词
Selenium; Line Intensity; Reaction Period; Rapid Thermal Processing; Technological Advantage;
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中图分类号
学科分类号
摘要
In this study, CuInSe2 thin films were prepared by the rapid thermal treatment (RTP) of metallic precursors in a close-spaced graphite container. The thermal diffusion process of selenium into the InSe/Cu/InSe precursor stacks critically influenced the structural properties (i.e., morphological features, formation of crystalline phases and in-depth compositional uniformity) of the films. In cases where pure elemental Se layers were incorporated into the stacks (i.e., InSe/Cu/InSe/Se), RTP treatment yielded compound films with poor structural properties. Single-phase material with uniform and dense surface morphologies was obtained when InSe/Cu/InSe precursors were reacted to an elemental Se atmosphere during RTP treatment. In these cases, single Se pellets were placed in close proximity to the samples in a partially closed graphite container. The container was then rapidly heated in 1 min to 550 °C, followed by a reaction period of 6 min at this temperature. X-ray fluorescence (XRF) Kα1,2 line intensity measurements from these specific samples, after different stages of etching, revealed a relatively high degree of in-depth compositional uniformity. The deposition of this high quality material with a relatively simple and rapid two-stage technique represents an important technological advantage.
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页码:285 / 290
页数:5
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