New high fill-factor dual-curvature microlens array fabrication using UV proximity printing

被引：0

作者：

Tsung-Hung Lin

Hsiharng Yang

Ching-Kong Chao

Shih-Yu Hung

Jen-Sung Hsu

机构：

[1] National Taiwan University of Science and Technology,Graduate Institute of Engineering

[2] National Chung Hsing University,Institute of Precision Engineering

[3] National Taiwan University of Science and Technology,Department of Mechanical Engineering

[4] Nan Kai University of Technology,Department of Automation Engineering

[5] Chung-Shan Institute of Science and Technology,Chemical Systems Research Division

来源：

Microsystem Technologies | 2011年 / 17卷

关键词：

Microlens Array; Light Intensity Distribution; High Fill Factor; Aperture Edge; Maximum Radiant Intensity;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

A new high fill-factor dual-curvature microlens array fabrication method using lithographic proximity printing process is reported. The proposed technology utilizes UV proximity printing by controlling a printing gap between the mask and substrate. The designed microlens array pattern with high density can produce a high fill-factor dual-curvature microlens array in photoresist. Because the UV light diffraction deflects away from the aperture edges and produces exposure in photoresist material outside the aperture edges, this method can precisely control the geometric profile of a high fill factor dual-curvature microlens array. The experimental results showed that the dual-curvature micro-lens array can be formed automatically in photoresist when the printing gap ranged from 360 to 600 μm. The gapless dual-curvature microlens array will be used to enhance the luminance uniformity for light-emitting diodes (LEDs).

引用

页码：601 / 607

页数：6