Effect of reactive ion etch-induced damage on the performance of 4H-SiC schottky barrier diodes

被引：0
|
作者：
V. Khemka
T. P. Chow
R. J. Gutmann
机构：
[1] Rensselaer Polytechnic Institute,Center for Integrated Electronics and Electronic Manufacturing
来源：
Journal of Electronic Materials | 1998年 / 27卷
关键词：
4H-SiC; etch damage; reactive ion etch (RIE); Schottky diodes;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The effect of reactive ion etch (RIE) induced damage on 4H-SiC surfaces etched in fluorinated plamas has been investigated and characterized using Ni Schottky diodes and x-ray photoelectron spectroscopic surface analysis. The diodes were characterized using current-voltage, current-voltage-temperature, and capacitance-voltage measurements with near ideal forward characteristics (n=1.07) and forward current density as high as 9000 A/cm2 from the control (unetched) devices. High current handling capability was observed in diodes with etched surfaces as well. Diodes with surfaces etched in CHF3 containing plasmas showed a significant reduction in the barrier height compared to the diodes with surfaces etched in CF4 containing plasma. Control devices exhibited high leakages when reverse biased, which is attributed to the presence of a thin (∼2 nm) oxide layer at the metal-semiconductor interface. However, under reverse bias diodes with CHF3-etched surfaces showed improvement in leakage current compared to diodes with CF4-etched surfaces and the control diodes.
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页码：1128 / 1135
页数：7
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