Nanosecond laser ablation for pulsed laser deposition of yttria

被引:0
|
作者
Sucharita Sinha
机构
[1] Bhabha Atomic Research Centre,Laser and Plasma Technology Division
来源
Applied Physics A | 2013年 / 112卷
关键词
Yttria; Material Removal; Pulse Laser Deposition; Target Surface; Laser Fluence;
D O I
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中图分类号
学科分类号
摘要
A thermal model to describe high-power nanosecond pulsed laser ablation of yttria (Y2O3) has been developed. This model simulates ablation of material occurring primarily through vaporization and also accounts for attenuation of the incident laser beam in the evolving vapor plume. Theoretical estimates of process features such as time evolution of target temperature distribution, melt depth and ablation rate and their dependence on laser parameters particularly for laser fluences in the range of 6 to 30 J/cm2 are investigated. Calculated maximum surface temperatures when compared with the estimated critical temperature for yttria indicate absence of explosive boiling at typical laser fluxes of 10 to 30 J/cm2. Material ejection in large fragments associated with explosive boiling of the target needs to be avoided when depositing thin films via the pulsed laser deposition (PLD) technique as it leads to coatings with high residual porosity and poor compaction restricting the protective quality of such corrosion-resistant yttria coatings. Our model calculations facilitate proper selection of laser parameters to be employed for deposition of PLD yttria corrosion-resistive coatings. Such coatings have been found to be highly effective in handling and containment of liquid uranium.
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页码:855 / 862
页数:7
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