Deposition of Films Based on Americium Isotopes by Vapor-Phase Thermal Decomposition of β-Diketonates and Their Adducts with Neutral Ligands

被引：0
|
作者：
L. D. Danilin
N. P. Pilipenko
M. Yu. Maksimov
A. E. Trikanov
机构：
[1] Russian Research Institute of Experimental Physics,Russian Federal Nuclear Center
来源：
Radiochemistry | 2002年 / 44卷 / 1期
关键词：
Iron; Copper; Aluminum; Physical Chemistry; Stainless Steel;
D O I：
10.1023/A:1014810814680
中图分类号：
学科分类号：
摘要：
Deposition of 243Am-based films by vapor-phase thermal decomposition of the americium hexafluoroacetylacetonate adduct Am(HFA)3·2TBP was studied. Films containing from fractions of microgram to several tens of micrograms of 243Am are deposited on iron, stainless steel, aluminum, and copper supports in a forevacuum (∼10-2 mm Hg) at 340-400°C. The highest yields of 243Am deposition (∼75-85%) were obtained on iron and steel supports. Americium is presumably deposited in the form of AmF3.
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页码：9 / 12
页数：3
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