Exploring microstencils for sub-micron patterning using pulsed laser deposition

被引：0

作者：

F. Vroegindeweij

E.A. Speets

J.A.J. Steen

J. Brugger

D.H.A. Blank

机构：

[1] University of Twente and MESA+ Institute for Nanotechnology,Faculty of Science & Technology

[2] Ecole Polytechnique Fédérale de Lausanne (EPFL),Microsystems Laboratory

来源：

Applied Physics A | 2004年 / 79卷

关键词：

Oxide; Silicon; Gold; Nickel; Titanate;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 μm down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.

引用

页码：743 / 745

页数：2

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