Exploring microstencils for sub-micron patterning using pulsed laser deposition

被引:0
|
作者
F. Vroegindeweij
E.A. Speets
J.A.J. Steen
J. Brugger
D.H.A. Blank
机构
[1] University of Twente and MESA+ Institute for Nanotechnology,Faculty of Science & Technology
[2] Ecole Polytechnique Fédérale de Lausanne (EPFL),Microsystems Laboratory
来源
Applied Physics A | 2004年 / 79卷
关键词
Oxide; Silicon; Gold; Nickel; Titanate;
D O I
暂无
中图分类号
学科分类号
摘要
The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 μm down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.
引用
收藏
页码:743 / 745
页数:2
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