Investigation of the Dependence of Argon Metastable State Population on the Conditions of High-Frequency Glow Discharge Excitation

被引：0

作者：

B. T. Baisova

A. S. Demin

A. A. Pushkarev

V. I. Strunin

G. Zh. Khudaibergenov

机构：

[1] F. M. Dostoevskii Omsk State University,

来源：

Russian Physics Journal | 2013年 / 56卷

关键词：

argon-silane plasma; glow discharge; argon metastable states; population of states; high-frequency discharge; thin film deposition; thin amorphous silicon films;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The population of metastable states of argon atoms in high-frequency glow discharge plasma is calculated. Dependences of the population of metastable states of argon atoms in the high-frequency glow discharge plasma on the standard gas flow rate (14–30 sccm) and vibration generator power (10–50 W) in the atmospheres of pure argon and argon-silane (95% Ar + 5% SiH4) mixture are investigated together with the dependence of the population of metastable states of argon atoms in the high-frequency glow discharge plasma on the silane content (0.5–5%) in the argon-silane mixture.

引用

页码：72 / 77

页数：5