Block copolymer adsorption from a homopolymer melt to an amine-terminated surface

被引：0

作者：

A. C. Costa

R. J. Composto

P. Vlček

M. Geoghegan

机构：

[1] University of Pennsylvania,Department of Materials Science and Engineering, Laboratory for Research on the Structure of Matter

[2] Academy of Sciences of the Czech Republic,Institute of Macromolecular Chemistry

[3] University of Sheffield,Department of Physics and Astronomy

[4] Hicks Building,undefined

来源：

The European Physical Journal E | 2005年 / 18卷

关键词：

68.08.De Structure, measurements and simulations; 61.12.Ha Neutron reflectometry; 83.80.Uv Block copolymers;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Using neutron reflectometry, the adsorption of diblock copolymers from a neutral polystyrene (PS) matrix is studied as a function of substrate type and non-adsorbing block degree of polymerization. The block copolymer is poly(deutero styrene)-block-poly(methyl methacrylate) and the substrates are silicon oxide, SiOx, and SiOx functionalized with (3-aminopropyl)triethoxysilane (APTES). We have determined the equilibrium volume fraction-depth profiles for such films, and compared them with volume fraction profiles generated by self-consistent mean-field (SCMF) theory and find good agreement between the experimental and theoretical data. SCMF calculations show that the segmental interaction energy between PS matrix chains and APTES is two orders of magnitude stronger than that between PS and SiOx.

引用

页码：159 / 166

页数：7

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