High-performance InGaP/GaAs pnp δ-doped heterojunction bipolar transistor

被引:0
|
作者
Jung-Hui Tsai
Shao-Yen Chiu
Wen-Shiung Lour
Der-Feng Guo
机构
[1] National Kaohsiung Normal University,Department of Electronic Engineering
[2] National Taiwan Ocean University,Department of Electrical Engineering
[3] Air Force Academy,Department of Electronic Engineering
来源
Semiconductors | 2009年 / 43卷
关键词
85.30.Pq; 73.40.Kp;
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暂无
中图分类号
学科分类号
摘要
In this article, a novel InGaP/GaAs pnp δ-doped heterojunction bipolar transistor is first demonstrated. Though the valence band discontinuity at InGaP/GaAs heterojunction is relatively large, the addition of a δ-doped sheet between two spacer layers at the emitter-base (E-B) junction effectively eliminates the potential spike and increases the confined barrier for electrons, simultaneously. Experimentally, a high current gain of 25 and a relatively low E-B offset voltage of 60 mV are achieved. The offset voltage is much smaller than the conventional InGaP/GaAs pnp HBT. The proposed device could be used for linear amplifiers and low-power complementary integrated circuit applications.
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页码:939 / 942
页数:3
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