Glancing angle sputter deposited tungsten trioxide (WO3) thin films for electrochromic applications

被引：0
作者：
K Naveen Kumar
Habibuddin Shaik
V Madhavi
R Imran Jafri
Jyothi Gupta
G Nithya
Sheik Abdul Sattar
G V Ashok Reddy
机构：
[1] Nitte Meenakshi Institute of Technology,Department of Physics
[2] Nitte Meenakshi Institute of Technology,Center for Nanomaterials and MEMS
[3] Nitte Meenakshi Institute of Technology,Department of ECE
[4] Interdisciplinary Centre for Energy Research,Department of Physics and Electronics
[5] Indian Institute of Science,Department of Physics
[6] Christ University,undefined
[7] SJB Institute of Technology,undefined
来源：
Applied Physics A | 2022年 / 128卷
关键词：
Glancing angle deposition; Tungsten oxide films; Electrochromism; Coloration efficiency; Diffusion coefficient; Transmittance;
D O I：
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中图分类号：
学科分类号：
摘要：
The columnar growth angle-dependent tungsten oxide (WO3) thin films were grown by using the Glancing angle sputter deposition (GLAD) technique with varying different substrate angles (00, 700, 750, and 800) on Fluorine-doped tin oxide (FTO) and Corning glass (CG) corning glass substrates at room temperature. The surface morphology, crystallographic structure, optical, and electrochemical properties were determined using X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM), Ultraviolet–Visible (UV–Vis) spectrometer, and electrochemical analyzer, respectively. The structural properties reveal that the films are amorphous in nature. FE-SEM studies observed the columnar growth of the nano-rods and surface porosity. The optical transmittance of the deposited films was decreased from 83 to 78%, and the optical bandgap decreased from 3.08 to 2.88 eV with increasing GLAD angle. The electrochemical studies reveal that the GLAD angle influenced the coloration efficiency (CE). The highest CE of 32 cm2/C at 600 nm and highest Diffusion coefficient (DC) of 6.529 × 10–9 cm2 s−1 of the films was observed for the films deposited at an angle of 750.
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