High-current pulsed electron beam modification on microstructure and performance of Cu/CuW diffusion bonding joints

被引:0
作者
Tian, Na-Na [1 ]
Zhang, Cong-Lin [1 ,2 ]
Lyu, Peng [1 ]
Guan, Jin-Tong [1 ]
Cai, Jie [3 ]
Guan, Qing-Feng [1 ]
Guo, Shun [1 ]
机构
[1] Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China
[2] Yancheng Inst Technol, Sch Mat Sci & Engn, Yancheng 221051, Peoples R China
[3] Jiangsu Univ, Engn Inst Adv Mfg & Modern Equipment Technol, Zhenjiang 212013, Peoples R China
基金
中国国家自然科学基金;
关键词
HCPEB; Element diffusion; Shear strength; Crystal defects; Surface modification; ALLOYING LAYER; STRENGTH; COPPER;
D O I
10.1007/s12598-024-02617-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This study investigates the influence of high-current pulsed electron beam (HCPEB) modification on the microstructure and shear strength of Cu/CuW joints. Reliable solid-state diffusion bonding of modified-Cu (M-Cu) and modified-CuW (M-CuW) was achieved by HCPEB modification pretreatment at a temperature of 800-900 degrees C and a pressure of 5 MPa for 10-50 min. Experiments demonstrate that HCPEB modification facilitates the dissolution of W and Cu, resulting in the formation of a Cu0.4W0.6 solid solution and thus enhancing the uniform distribution of microstructures. Additionally, HCPEB-induced defects play a beneficial role in promoting the diffusion process by providing fast diffusion paths for elements. The optimal joints with the maximum shear strength of 213.7 MPa were obtained through bonding M-Cu and M-CuW at 900 degrees C and 5 MPa for 30 min, which attributes to the combined effects of fine-grained strengthening and solid solution strengthening. Overall, the application of HCPEB modification showcases its effectiveness in promoting element diffusion and enhancing the mechanical performance of the joints.
引用
收藏
页码:2819 / 2831
页数:13
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