Mechanical properties of nanostructured amorphous metal multilayer thin films

被引:0
|
作者
J. B. Vella
A. B. Mann
H. Kung
C. L. Chien
T. P. Weihs
R. C. Cammarata
机构
[1] Motorola Inc.,Advanced Products Research and Development Lab
[2] Division of Materials Sciences and Engineering (SC-13),U.S. Department of Energy
[3] The Johns Hopkins University,Department of Materials Science & Engineering
[4] Rutgers University,Department of Ceramic & Materials Engineering
[5] Los Alamos National Laboratory,Division of Materials Sciences and Technology
[6] The Johns Hopkins University,Department of Physics & Astronomy
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
The hardness of amorphous metal multilayered films was investigated by nanoindenation. Bilayer material systems of amorphous CuNb, FeB, and FeTi were produced by dc sputtering on 〈112-0〉 sapphire substrates to a total thickness of 1 μm. The bilayer periods (Λ) ranged from 2 to 50 nm. The films’ noncrystallinity was verified by x-ray diffraction (XRD) and electron diffraction. The layer structure was verified by transmission electron microscopy and grazing angle XRD. The hardness and elastic modulus properties of the films, measured by nanoindentation, were shown to be statistically equivalent to the rule mixtures predictions. The hardness behavior is in contrast with the behavior of crystalline multilayered films, which generally display significant enhancements as the bilayer period is decreased below 10 nm. The lack of a significant hardness variation in the amorphous films strongly suggests that dislocation-mediated mechanisms do not govern inhomogeneous flow in amorphous metals.
引用
收藏
页码:1840 / 1848
页数:8
相关论文
共 50 条
  • [31] Hydrogen-induced mechanical properties of amorphous silicon thin films
    Shaik, Habibuddin
    Rao, Mohan G.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2015, 38 : 165 - 170
  • [32] Mechanical properties of amorphous Ta100-xCrx thin films
    Grundfos Electronics, Bjerringbro, Denmark
    Mater Sci Eng A Struct Mater Prop Microstruct Process, (871-873):
  • [33] INTERDIFFUSION IN AMORPHOUS FEB MULTILAYER THIN-FILMS
    REILL, W
    HOFFMANN, H
    ROLL, K
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1985, 4 (03) : 359 - 362
  • [34] Mechanical properties of amorphous silicon carbonitride thin films at elevated temperatures
    Ctvrtlik, Radim
    Al-Haik, Marwan S.
    Kulikovsky, Valeriy
    JOURNAL OF MATERIALS SCIENCE, 2015, 50 (04) : 1553 - 1564
  • [35] Mechanical properties of amorphous silicon carbonitride thin films at elevated temperatures
    Radim Ctvrtlik
    Marwan S. Al-Haik
    Valeriy Kulikovsky
    Journal of Materials Science, 2015, 50 : 1553 - 1564
  • [36] Mechanical properties of amorphous Ta100-xCrx thin films
    Andersen, P
    Bottiger, J
    Dyrbye, K
    Hutchings, IM
    Rutherford, KL
    Wroblewski, A
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1997, 226 : 871 - 873
  • [37] Optical properties of nanostructured thin films
    Flory, F
    Escoubas, L
    PROGRESS IN QUANTUM ELECTRONICS, 2004, 28 (02) : 89 - 112
  • [38] Tribological properties of nanostructured thin films
    Jellad, A.
    Maciejak, O.
    Labdi, S.
    MATERIAUX & TECHNIQUES, 2005, 93 (7-8):
  • [39] Effects of Oxygen Incorporation on the Physical Properties of Amorphous Metal Thin Films
    Muir, Sean W.
    Cowell, E. William
    Wang, Wei
    Wager, John F.
    Keszler, Douglas A.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2014, 118 (18): : 9647 - 9651
  • [40] Measurement of mechanical properties of thin films and nanostructured materials at high spatial resolution
    Bull, S. J.
    THERMEC 2006, PTS 1-5, 2007, 539-543 : 3534 - 3539