Role of humidity and surface roughness on direct wafer bonding

被引:3
|
作者
Persson, B. N. J. [1 ,2 ]
Mate, C. Mathew [3 ]
机构
[1] Forschungszentrum Julich, Peter Grunberg Inst PGI 1, D-52425 Julich, Germany
[2] MultiscaleConsulting, Wolfshovener Str 2, D-52428 Julich, Germany
[3] SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA
基金
美国国家科学基金会;
关键词
CONTACT MECHANICS; CAPILLARY CONDENSATION; RUBBER-FRICTION; ADHESION; ENERGY; FORCE; DRY;
D O I
10.1140/epjb/s10051-024-00680-w
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Bodies made from elastically stiff material usually bind very weakly unless the surfaces are flat and extremely smooth. In direct wafer bonding flat surfaces bind by capillary bridges and by the van der Waals interaction, which act between all solid objects. Here we study the dependency of the work of adhesion on the humidity and surface roughness in hydrophilic direct wafer bonding. We show that the long-wavelength roughness (usually denoted waviness) has a negligible influence on the strength of wafer bonding (the work of adhesion) from the menisci that form from capillary condensation of water vapor.
引用
收藏
页数:13
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