Photodissociation Dynamics of DNA Bases

被引：0
作者：
E. Sarantopoulou
Z. Kollia
A.C. Cefalas
S. Kobe
Z. SamardŽija
机构：
[1] National Hellenic Research Foundation,
[2] TPCI,undefined
[3] Jozef Stefan Institute,undefined
来源：
Journal of Biological Physics | 2003年 / 29卷
关键词：
157 nm; Cytosine; DNA photo-damage; mass spectroscopy; molecular dynamics; photo ablation; T Hz radiation; vacuum ultraviolet;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
In order to access the damaging mechanismsof DNA and its bases on themolecular level by T Hz radiation, it isnecessary to create a database of assessingdamage at different spectral regions.Possible damage by T Hz radiation will beassessed by comparison. Furthermore, theexpose of the cytosine to radiation at157 nm, suggest that photochemical bondbreaking is the only damaging mechanism inthe vacuum ultraviolet region of thespectrum, (157–170) nm where one photonbreaks one chemical bond.
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页码：149 / 158
页数：9
相关论文
共 29 条
[1]  
Dreisewerd K.(1996)Matrix-Assisted Laser Desorption/Ionization with Nitrogen Lasers of Different Pulse Widths Int. J. Mass Spectrom. Ion Processes 154 171-175
[2]  
Schürenberg M.(1996)Excited-State Relaxation Processes of Maldi-Matrices Studied by Luminescence Spectroscopy Appl. Surf. Sci. 57 96-98
[3]  
Karas M.(1996)Ice as a Matrix for IR-Matrix-Assisted Laser Desorption/Ionization: Mass-Spectra from a Protein Single Crystal Proc. Natl. Acad. Sci. U.S.A. 93 7003-7007
[4]  
Hillenkamp F.(1982)Self-Developing Photoetching of Poly(ethylene terephthalate) Films by Far-Ultraviolet Excimer Laser Radiation Appl. Phys. Lett. 41 576-578
[5]  
Ehring H.(2000)Mass-Spectroscopy and Ablation Characteristics of Nylon 6.6 in the Ultraviolet Appl. Phys. A 70 21-28
[6]  
Sundqvist B.U.R.(1986)Dynamics of UV Laser Ablation of Organic Polymer Surfaces J. Appl. Phys. 60 3315-3322
[7]  
Berkenkamp S.(1986)Nanosecond Photoacoustic Studies on Ultraviolet-Laser Ablation of Organic Polymers Appl. Phys. Lett. 48 445-447
[8]  
Karas M.(1985)Laser Ablation of Organic Polymers: Microscopic Models for Photochemical and Thermal Processes J. Appl. Phys. 57 2909-2914
[9]  
Hillenkamp F.(1984)A microscopic molel for the Ablative Photodecomposition of Polymers by Far Ultraviolet Radiation (193 nm Appl. Phys. Lett 44 849-851
[10]  
Srinivasan R.(1996)The Role of Excited Species in Ultraviolet-Laser Materials Ablation 3. Nonstationary Ablation of Organic Polymers Appl. Phys. A 62 397-401
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