Effect of heat treatment on the structure of titanium dioxide films

被引：0
|
作者：
A. E. Komlev
A. E. Lapshin
O. V. Magdysyuk
V. V. Plotnikov
V. I. Shapovalov
N. S. Shutova
机构：
[1] St. Petersburg State Electrotechnical University,Grebenshchikov Institute of Silicate Chemistry
[2] Russian Academy of Sciences,undefined
来源：
Technical Physics Letters | 2010年 / 36卷
关键词：
Rutile; Technical Physic Letter; Anatase Phase; Rutile Phase; Isothermal Annealing;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The development of nanocrystalline phases during isothermal annealing of titanium dioxide films deposited by reactive magnetron sputtering at various rates onto silica glass substrates has been studied. It is established that the heat treatment at temperatures within 500–700°C in air or in vacuum leads to significantly different results, depending on the initial crystalline structure of as-deposited films.
引用
收藏
页码：942 / 944
页数：2
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