Design of a Highly Stable and Robust 10T SRAM Cell for Low-Power Portable Applications

被引:0
作者
Erfan Abbasian
Morteza Gholipour
机构
[1] Babol Noshirvani University of Technology,Faculty of Electrical and Computer Engineering
来源
Circuits, Systems, and Signal Processing | 2022年 / 41卷
关键词
Single-ended; SRAM; Low-power; Stability; Robustness; Schmitt-trigger;
D O I
暂无
中图分类号
学科分类号
摘要
This paper investigates a novel highly stable and robust single-ended 10T SRAM cell appropriate for low-power portable applications. The cell core of the proposed design is a combination of a normal inverter with a stacked NMOS transistor and a Schmitt-trigger (ST) inverter with a double-length pull-up transistor. This improves hold stability and leakage power dissipation. The read and write operations of the proposed cell are performed with the aid of separated paths and bitlines, lowering power consumption. The strong cell core and decoupled read path eliminate the read-disturbance issue in the proposed cell, resulting in read static noise margin (RSNM) enhancement. Furthermore, the feedback-cutting write-assist technique used in the proposed design mitigates the writing ‘1’ issue; consequently, write static noise margin (WSNM)/write margin (WM) improves. To prove the superiority of the proposed SRAM cell in various performance metrics, it is compared with state-of-the-art SRAM cells, introduced as 6T, TG9T, 10T-P1, and SB11T, using HSPICE and 16-nm CMOS technology node taking into consideration the impact of the severe process, voltage, and temperature (PVT) variations. Obtained results at VDD = 0.7 V show that the proposed design offers the highest HSNM/RSNM/WSNM (or WM). The read/write delay of the proposed cell is 3.92X/2.37X higher than that of the 6T SRAM cell due to its single-ended reading/writing structure. However, in terms of power consumption, the proposed cell exhibits 1.64X/1.54X lower than that of 6T SRAM cell. Though the proposed cell occupies a 1.24X higher area compared with the 6T SRAM cell due to its higher count of transistor, it shows the highest proposed figure of merit among all the studied SRAM cells, which is 26.90X higher than that of 6T SRAM cell.
引用
收藏
页码:5914 / 5932
页数:18
相关论文
共 85 条
[1]  
Abbasian E(2020)A variation-aware design for storage cells using Schottky-barrier-type GNRFETs J. Comput. Electron. 19 987-1001
[2]  
Gholipour M(2021)Design of a Schmitt-Trigger-based 7T SRAM cell for variation resilient low-energy consumption and reliable internet of things applications AEU-Int. J. Electron. Commun. 138 970-989
[3]  
Abbasian E(2021)Single-ended half-select disturb-free 11T static random access memory cell for reliable and low power applications Int. J. Circuit Theory Appl. 49 3630-3652
[4]  
Gholipour M(2022)A low-leakage single-bitline 9T SRAM cell with read-disturbance removal and high writability for low-power biomedical applications Int. J. Circuit Theory Appl. 49 1-9
[5]  
Abbasian E(2021)Performance evaluation of GNRFET and TMDFET devices in static random access memory cells design Int. J. Circuit Theory Appl. 11 1606-1616
[6]  
Gholipour M(2022)A 9T high-stable and Low-Energy Half-Select-Free SRAM Cell Design using TMDFETs Analog Integr. Circuit Sig. Process. 69 3081-3105
[7]  
Abbasian E(2022)Ultra-low-power and stable 10-nm FinFET 10T sub-threshold SRAM Microelectron. J. 41 2634-2642
[8]  
Gholipour M(2022)A single-bitline 9T SRAM for low-power near-threshold operation in FinFET technology Arab. J. Sci. Eng. 24 1-11
[9]  
Abbasian E(2022)A reliable low standby power 10T SRAM cell with expanded static noise margins IEEE Trans. Circuits Syst. I Regul. Pap. 62 337-349
[10]  
Gholipour M(2022)A Schmitt-Trigger-based low-voltage 11 T SRAM cell for low-leakage in 7-nm FinFET technology Circuits Syst. Signal Process. 18 1252-1263