Cracks tamed

被引：0
作者：
Antonio J. Pons
机构：
[1] Polytechnic University of Catalonia,Antonio J. Pons is in the Department of Physics and Nuclear Engineering
[2] Terrassa,undefined
[3] Barcelona 08222,undefined
[4] Spain.,undefined
来源：
Nature | 2012年 / 485卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Crack propagation in materials is rarely welcome. But carefully engineered cracks produced during the deposition of a film on silicon can be used to efficiently create pre-designed patterns of nanometre-scale channels. See Letter p.221
引用
收藏
页码：177 / 178
页数：1
相关论文
共 17 条
[11]  
Karma A(undefined)undefined undefined undefined undefined-undefined
[12]  
Chou SY(undefined)undefined undefined undefined undefined-undefined
[13]  
Keimel C(undefined)undefined undefined undefined undefined-undefined
[14]  
Gu J(undefined)undefined undefined undefined undefined-undefined
[15]  
Kumar G(undefined)undefined undefined undefined undefined-undefined
[16]  
Tang HX(undefined)undefined undefined undefined undefined-undefined
[17]  
Schroers J(undefined)undefined undefined undefined undefined-undefined
12