Cracks tamed

被引：0

作者：

Antonio J. Pons

机构：

[1] Polytechnic University of Catalonia,Antonio J. Pons is in the Department of Physics and Nuclear Engineering

[2] Terrassa,undefined

[3] Barcelona 08222,undefined

[4] Spain.,undefined

来源：

Nature | 2012年 / 485卷

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D O I：

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摘要：

Crack propagation in materials is rarely welcome. But carefully engineered cracks produced during the deposition of a film on silicon can be used to efficiently create pre-designed patterns of nanometre-scale channels. See Letter p.221

引用

页码：177 / 178

页数：1

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