Influence of substrate compliance on buckling delamination of thin films

被引:0
|
作者
Hong-Hui Yu
John W. Hutchinson
机构
[1] Harvard University,Division of Engineering and Applied Sciences
来源
International Journal of Fracture | 2002年 / 113卷
关键词
Buckling; delamination; elastic mismatch; substrate compliance; thin films.;
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中图分类号
学科分类号
摘要
A thin film subject to in-plane compressive stress is susceptible to buckling-driven delamination. This paper analyzes a straight-sided delamination buckle with a focus on the effects of substrate compliance, following earlier work by B. Cotterell and Z. Chen. The critical buckling condition, the energy release rate and the mode mix of the interface delamination crack are calculated as a function of the elastic mismatch between the film and substrate. The average energy release rate at the curved end of a tunneling straight-sided blister is also determined. The more compliant the substrate, the easier for the film to buckle and the higher the energy release rates. The effect becomes significant when the modulus of the substrate is appreciably less than that of the film. When the substrate modulus is comparable to that of the film, or higher, the usual assumption is justified to the effect that the film is clamped along its edges. When the substrate is very compliant the energy release rate at the curved front exceeds that along the straight sides.
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页码:39 / 55
页数:16
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