The Influence of Metal Masks on Matching of the Lower Electrode and a High-Frequency Bias Generator at Reactive Ion Etching of Large Substrates

被引：0

作者：

S. D. Poletayev

A. I. Lyubimov

机构：

[1] Image Processing Systems Institute,

[2] Federal Research Center “Crystallography and Photonics,undefined

[3] ” State Russian Academy of Sciences,undefined

[4] Samara State University,undefined

[5] State Institute of Applied Optics,undefined

来源：

Technical Physics Letters | 2021年 / 47卷

关键词：

diffraction microrelief; reactive ion etching; impedance; substrate holder; lower electrode.;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：569 / 572

页数：3

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