Studies on Optimal Gas Supply For a Maskless Etching System with Micro- Discharge Plasma Operated at Atmospheric Pressure

被引:0
|
作者
Toshiyuki Hamada
Takuya Arimura
Tatsuya Sakoda
机构
[1] Miyazaki Prefectural Government Public Enterprise Bureau,Electricity Division
[2] University of Miyazaki,Department of Electrical and Electronic Engineering
来源
Plasma Chemistry and Plasma Processing | 2012年 / 32卷
关键词
Maskless etching; Micro-discharge plasma; Atmospheric pressure; Optimal gas supply;
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中图分类号
学科分类号
摘要
An optimal gas supply method for the micro discharge plasma generated along a quartz glass electrode, which was useful for the maskless fabrication of electrode grooves for surface electrodes on solar cells, was examined. We here constructed an electrode system with gas inlet and outlet holes. The gas supply directly to the plasma region contributed to reduce byproducts on the surface being etched, and then it was confirmed that the uniform etching was achieved in the case where the micro-discharge plasma locally produced at the etching area.
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页码:325 / 332
页数:7
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