Fabrication of 3-D Submicron Glass Structures by FIB

被引:0
作者
C.H. Chao
S.C. Shen
J.R. Wu
机构
[1] National Sun Yat-Sen University,Department of Mechanical and Electro
[2] National Cheng Kung University,Mechanical Engineering, and Center for Nanoscience & Nanotechnology
来源
Journal of Materials Engineering and Performance | 2009年 / 18卷
关键词
focused-ion beam; pyrex glass; submicron; XeF;
D O I
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中图分类号
学科分类号
摘要
The fabrication characteristic of focused ion beam (FIB) for Pyrex glass was investigated. FIB has several advantages such as high resolution, high material removal rates, low forward scattering, and direct fabrication in selective area without any etching mask. In this study, FIB-etched Pyrex glass was used for fast fabrication of 3-D submicron structures. A glass structure with 0.39 μm in width was fabricated. The experimental results in terms of limiting beam size, ion dose (ion/cm2), and beam current are discussed. The influence of XeF2 gas on FIB glass fabrication was investigated.
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页码:878 / 885
页数:7
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共 60 条
  • [11] Mathies R.A.(2000)High Quality Mechanical Etching of Brittle Materials by Powder Blasting Sens. Actuators A 85 296-303
  • [12] Iliescu C.(1987)Critical Review: Focused Ion Beam Technology and Applications J. Vac. Sci. Technol. B 5 469-495
  • [13] Miaob J.(1991)Focused-ion-beam ‘Cutter’ and ‘Attacher’ for Micromachining and Device Transplantation J. Vac. Sci. Technol. B 9 2633-2637
  • [14] Tay F.E.H.(1988)Scanning Ion Microscopy and Microsectioning of Electron Beam Recrystallized Silicon on Insulator Devices J. Vac. Sci. Technol. B 6 1940-1943
  • [15] Gretillat M.A.(1990)Fabrication of Planar and Cross-sectional TEM Specimens Using a Focused Ion Beam Mater. Res. Soc. Symp. 199 205-216
  • [16] Croman T.(2006)Rapid and Three-dimensional Nanoimprint Template Fabrication Technology Using Focused Ion Beam Lithography Microelectron. Eng. 83 940-942
  • [17] Enokson P.(2006)IR-laser Assisted Micro/Nano-imprinting J. Micromech. Microeng. 16 1463-1467
  • [18] Stemme G.(2007)Focused-ion-beam Direct Structuring of Fused Silica for Fabrication of Nano-imprinting Templates J. Microelectron. Eng. 84 829-832
  • [19] Youn S.W.(2007)A Study of Fused Silica Micro/Nano Patterning by Focused-ion-beam J. Appl. Surf. Sci. 253 3608-3614
  • [20] Kang C.G.(1986)Sputtering of SiO J. Vac. Sci. Technol. 6 1278-1282