Fabrication of 3-D Submicron Glass Structures by FIB

被引：0
作者：
C.H. Chao
S.C. Shen
J.R. Wu
机构：
[1] National Sun Yat-Sen University,Department of Mechanical and Electro
[2] National Cheng Kung University,Mechanical Engineering, and Center for Nanoscience & Nanotechnology
来源：
Journal of Materials Engineering and Performance | 2009年 / 18卷
关键词：
focused-ion beam; pyrex glass; submicron; XeF;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The fabrication characteristic of focused ion beam (FIB) for Pyrex glass was investigated. FIB has several advantages such as high resolution, high material removal rates, low forward scattering, and direct fabrication in selective area without any etching mask. In this study, FIB-etched Pyrex glass was used for fast fabrication of 3-D submicron structures. A glass structure with 0.39 μm in width was fabricated. The experimental results in terms of limiting beam size, ion dose (ion/cm2), and beam current are discussed. The influence of XeF2 gas on FIB glass fabrication was investigated.
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页码：878 / 885
页数：7
相关论文
共 60 条
  • [1] Shan X.C.(2002)Development of a Micro Hot Embossing Process for Fabricating Micro-optical Devices Proc. SPIE 4936 67-75
  • [2] Maeda R.(1993)Glass Chips for High-speed Capillary Electrophoresis Separations with Submicrometer Plate Heights Anal. Chem. 65 652637-652642
  • [3] Murakoshi Y.(1994)Micromachining of Capillary Electrophoresis Injectors and Separators on Glass Chips and Evaluation of Flow at Capillary Intersections Anal. Chem. 66 177-184
  • [4] Effenhauser C.S.(1998)Micro-fabrication Technology for the Production of Capillary Array Electrophoresis Chips Biomed. Microdevices 1 7-25
  • [5] Manz A.(2005)Optimization of an Amorphous Silicon Mask PECVD Process for Deep Wet Etching of Pyrex Glass Surf. Coat. Technol. 192 43-47
  • [6] Widmer H.M.(1997)A New Fabrication Method for Borosilicate Glass Capillary Tubes with Lateral Inlets and Outlets Sens. Actuators A 60 219-222
  • [7] Fan Z.H.(1998)Deep Wet Etching of Borosilicate Glass Using an Anodically Bonded Silicon Substrate as Mask J. Micromech. Microeng. 8 84-87
  • [8] Harrison D.J.(2005)Maskless Pattern Fabrication on Pyrex 7740 Glass Surface by Using Nano-scratch with HF Wet Etching Scripta Mater. 52 117-121
  • [9] Simpson P.C.(2001)Deep Reactive Ion Etching of Pyrex Glass Using SF6 Plasma Sens. Actuators A 87 139-145
  • [10] Woolley A.T.(2000)The Introduction of Powder Blasting for Sensor and Microsystem Applications Sens. Actuators A 84 330-337
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