Pulse laser deposition of vanadium dioxide films

被引：4
|
作者：
Novodvorsky O.A. [1 ]
Parshina L.S. [1 ]
Khramova O.D. [1 ]
机构：
[1] Institute of Laser and Information Technologies, Russian Academy of Sciences, Shatura, Moscow oblast
来源：
Bulletin of the Russian Academy of Sciences: Physics | 2016年 / 80卷 / 4期
关键词：
Vanadium; Oxygen Pressure; Sapphire Substrate; Vanadium Oxide; Crystalline Film;
D O I：
10.3103/S1062873816040262
中图分类号：
学科分类号：
摘要：
Thin amorphous and crystalline films of VO2 are obtained on (0001) sapphire substrates via pulsed laser deposition with the speed separation of particles under a variety of deposition conditions. The electrical and optical properties of the films in the vicinity of the phase transition in the temperature range of 20 to 100°C are studied. The temperature of transition (Tc) and the width of the hysteresis are found to be 67.5 and 3°C, respectively. © 2016, Allerton Press, Inc.
引用
收藏
页码：376 / 380
页数：4
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