Phase separation and surface properties of poly(propyl methacrylate-b-methyl methacrylate) diblock copolymers

被引:0
作者
Doris Pospiech
Renata Choińska
Kathrin Eckstein
Dieter Jehnichen
Liane Häußler
Peter Friedel
Frank Simon
Uta Reuter
Brigitte Voit
机构
[1] Prof. Wacław Dąbrowski Institute of Agricultural and Food Biotechnology,
[2] Leibniz-Institut für Polymerforschung Dresden e.V,undefined
[3] Technische Universität Dresden,undefined
[4] Organic Chemistry of Polymers,undefined
来源
Polymer Bulletin | 2019年 / 76卷
关键词
Methacrylic diblock copolymers; Nanophase separation; Thin film; Wetting;
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摘要
The phase separation and surface characteristics of poly(propyl methacrylate-b-methyl methacrylate) (PPrMA-b-PMMA) diblock copolymers were studied and compared to strongly phase-separated poly(pentyl methacrylate-b-methyl methacrylate) (PPMA-b-PMMA) block copolymers (BCPs). PPrMA-b-PMMA with varied compositions and molar masses was synthesized by living anionic polymerization. The phase separation was studied by DSC, SAXS, TEM and AFM. The experimental data were compared to the calculated phase diagram. PPrMA-b-PMMA BCPs were weakly phase-separated, and indications for the existence of a relative broad interface between the blocks were observed. Nevertheless, two ordered morphologies—hexagonally packed cylinders and lamellae—depending on the molar composition were distinguished. The phase separation in thin films was studied by AFM in comparison with PPMA-b-PMMA. The wetting behavior of the thin films was examined by contact angle measurements. The water contact angles on PPrMA-b-PMMA were clearly influenced by both blocks. XPS confirmed the presence of both blocks in the top surface layer, which was different to PPMA-b-PMMA diblock copolymers where the top layer consisted only of PPMA blocks. Thus, only the weakly phase-separated PPrMA-b-PMMA BCP system allowed the generation of phase-separated films with tunable wetting characteristics.
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页码:271 / 289
页数:18
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共 187 条
[1]  
Kim H-C(2010)Block copolymer based nanostructures: materials, processes, and applications to electronics Chem Rev 110 146-177
[2]  
Park S-M(2003)Enabling nanotechnology with self-assembled block copolymer patterns Polymer 44 6725-6760
[3]  
Hinsberg WD(2010)High-k organic, inorganic, and hybrid dielectrics for low-voltage organic field-effect transistors Chem Rev 110 205-239
[4]  
Park C(2006)Templated self-assembly of block copolymers: top-down helps bottom-up Adv Mater 18 2505-2521
[5]  
Yoon J(2010)Directed self-assembly of nanoparticles ACS Nano 4 3591-3605
[6]  
Thomas JL(2006)Study of the phase behavior of poly(pentyl methacrylate-b-methyl methacrylate) diblock copolymers J Nanostruct Polym Nanocompos 2 43-51
[7]  
Ortiz RP(1999)Comparison of interfacial width of block copolymers of d Macromolecules 32 1859-1864
[8]  
Facchetti A(1995)- poly(methyl methacrylate) with various poly(n-alkyl methacrylate)s and the respective homopolymer pairs as measured by neutron reflection Macromolecules 28 8796-8806
[9]  
Marks TJ(1996)Polyisoprene-polystyrene diblock copolymer phase diagram near the order-disorder transition Macromolecules 29 2857-2867
[10]  
Cheng JY(2001)Phase behavior of polystyrene-poly(2-vinylpiridine) diblock copolymers Macromolecules 34 2947-2957