Optical and Structural Properties of TiO2 Thin Films Deposited by RF Magnetron Sputtering

被引：0
|
作者：
R. Shakoury
A. Zarei
机构：
[1] Imam Khomeini International University,Physics Department, Faculty of Science
[2] Alzahra University,Physics Department
来源：
Silicon | 2019年 / 11卷
关键词：
TiO; films; RF magnetron sputtering; Optical and structural properties; Amorphous to crystalline transition;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Titanium dioxide thin films were grown by RF magnetron sputtering. After that, deposited TiO2 films were annealed at 300 °C for 2 h. Having used different oxygen flow rates as a reactive gas, optical properties of TiO2 thin films changed. Refractive index n, extinction coefficient k and the thickness of the films were calculated from the transmittance spectra and the refractive indices were optimized. The extinction coefficient decreased due to the film oxidation. Different structures characterized by X-ray diffraction pattern and the crystallization of TiO2 films improved. Moreover, the stability of crystalline phase was studied, and the optical gap energy was calculated by Tauc relation.
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收藏
页码：1247 / 1252
页数：5
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