Improved Linearity with Polarization Coulomb Field Scattering in AlGaN/GaN Heterostructure Field-Effect Transistors

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作者
Peng Cui
Yuanjie Lv
Huan Liu
Aijie Cheng
Chen Fu
Zhaojun Lin
机构
[1] Shandong University,School of Microelectronics
[2] Hebei Semiconductor Research Institute,National Key Laboratory of Application Specific Integrated Circuit (ASIC)
[3] Shandong University,School of Mathematics
来源
Scientific Reports | / 8卷
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摘要
The single-tone power of the AlGaN/GaN heterostructure field-effect transistors (HFETs) with different gate widths was measured. A distinct improvement in device linearity was observed in the sample with a larger gate width. The analysis of the variation of the parasitic source access resistance showed that, as the gate bias is increased, the polarization Coulomb field scattering can offset the increased polar optical phonon scattering and improve the device linearity. This approach is shown to be effective in improving the device linearity of AlGaN/GaN HFETs.
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  • [1] Maassen D(2017)70W GaN-HEMT Ku-band power amplifier in MIC technology IEEE Trans. Microw. Theory Techn. 65 1272-1283
  • [2] Paine BM(2017)Fast-pulsed characterizations of RF GaN HEMTs during wearout IEEE Trans. Device Mater. Rel. 17 184-190
  • [3] Polmanter SR(2005)A High-power RF switch IC using AlGaN/GaN HFETs with single-stage configuration IEEE Trans. Electron Devices. 52 1893-1899
  • [4] Ng VT(2003)Linearity characteristics of microwave-power GaN HEMTs IEEE Trans. Microw. Theory Techn. 51 660-664
  • [5] Kubota NT(2002)Temperature-dependent nonlinearities in GaN/AlGaN HEMTs IEEE Trans. Electron Devices. 49 710-717
  • [6] Ignacio CR(2015)Improved linearity in AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors with nonlinear polarization dielectric Appl. Phys. Lett. 106 243501-565
  • [7] Ishida H(2006)Use of double-channel heterostructures to improve the access resistance and linearity in GaN-based HEMTs IEEE Trans. Electron Devices. 53 562-1477
  • [8] Nagy W(2007)Electron mobility related to scattering caused by the strain variation of AlGaN barrier layer in strained AlGaN/GaN heterostructures Appl. Phys. Lett. 91 173507-1303
  • [9] Brown J(2014)Theoretical model of the polarization Coulomb field scattering in strained AlGaN/AlN/GaN heterostructure field-effect transistors J. Appl. Phys. 116 044507-119
  • [10] Borges R(2016)Effect of polarization Coulomb field scattering on parasitic source access resistance and extrinsic transconductance in AlGaN/GaN heterostructure FETs IEEE Trans. Electron Devices. 63 1471-3913