Optical properties investigation of [nc-Si:SiO2/SiO2]30 periodic multilayer films

被引：0
|
作者：
Liang Feng
Jiang Zhu
Shenjin Wei
Huanfeng Zhu
Kun Chen
Da Xu
Jing Li
机构：
[1] Fudan University,Department of Optical Science and Engineering
[2] Fudan University,Key Laboratory of Micro and Nano Photonic Structures (Ministry of Education)
来源：
Applied Physics A | 2012年 / 109卷
关键词：
Optical Bandgap; Spectroscopic Ellipsometry; SiO2 Matrix; Spectroscopic Ellipsometry Measurement; Spectroscopic Ellipsometry Data;
D O I：
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中图分类号：
学科分类号：
摘要：
The optical properties of 30-layer [nc-Si:SiO2/SiO2]30 periodic films have been studied. The films were prepared by alternately evaporating SiO and SiO2 onto Si(100) substrates, followed by annealing at 1100 ∘C. Spectroscopic ellipsometry spectrum analysis was used to determine the optical constants of the samples via the Forouhi–Bloomer model. The optical bandgap of a single periodic film is calculated. The photoluminescence (PL) spectra of three samples with different thicknesses clearly show that there are two physical origins of the PL process.
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页码：547 / 551
页数：4
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