Detailed study on MOCVD of wafer-scale MoS2 monolayers: From nucleation to coalescence

被引：0
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作者：
Songyao Tang
Annika Grundmann
Hleb Fiadziushkin
Amir Ghiami
Michael Heuken
Andrei Vescan
Holger Kalisch
机构：
[1] RWTH Aachen University,Compound Semiconductor Technology
[2] AIXTRON SE,undefined
来源：
MRS Advances | 2022年 / 7卷
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页码：751 / 756
页数：5
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