Effect of rf Plasma Treatment on the Germination and Phytosanitary State of Seeds

被引：0
作者：
I. I. Filatova
V. V. Azharonok
S. V. Goncharik
V. A. Lushkevich
A. G. Zhukovsky
G. I. Gadzhieva
机构：
[1] National Academy of Sciences of Belarus,B. I. Stepanov Institute of Physics
[2] Institute of Plant Protection,undefined
来源：
Journal of Applied Spectroscopy | 2014年 / 81卷
关键词：
low-temperature plasma; rf discharge; seeds; germination; fungicide and bactericide effects; optical emission spectroscopy; scanning electron microscope; gas temperature;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Optical spectroscopic techniques are used to study the spectral and energy characteristics and to determine the gas temperature of rf discharges for treating cereal and legume seeds. It is shown that active plasma particles produce a change in the morphology of seed coats. The optimal conditions for plasma processing prior to planting, such that its biological effectiveness is greatest, are realized for a specific discharge power of ~0.35 W/cm3 and an exposure time of 5–7 min.
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页码：250 / 256
页数：6
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