The influence of mixed phases on optical properties of HfO2 thin films prepared by thermal oxidation

被引:0
|
作者
Yizhu Xie
Ziwei Ma
Yuroug Su
Yanxia Liu
Lixin Liu
Haiting Zhao
Jinyuan Zhou
Zhenxing Zhang
Jian Li
Erqing Xie
机构
[1] Lanzhou University,Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education
来源
Journal of Materials Research | 2011年 / 26卷
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Hafnium dioxide (HfO2) thin films were synthesized on silicon and quartz substrates by thermal oxidation of metallic hafnium films in oxygen. The crystalline structure and optical properties of the HfO2 films were systematically investigated using x-ray diffraction, ultraviolet (UV)-Raman, and UV-visible spectrophotometer techniques. All the films thermally oxidized at 450 to 800 °C were mostly monoclinic. Interestingly, cubic phase coexisted with monoclinic phase in the films thermally oxidized at 500 to 600 °C. The corresponding optical band gap (Eg) varied from 5.92 to 6.08 eV for the films with a different phase ratio (cubic to monoclinic one) ranging between 0 and 1:3. These results imply that the mixed phase could have a certain effect on the increase of the Eg of HfO2 films.
引用
收藏
页码:50 / 54
页数:4
相关论文
共 50 条
  • [1] The influence of mixed phases on optical properties of HfO2 thin films prepared by thermal oxidation
    Xie, Yizhu
    Ma, Ziwei
    Su, Yuroug
    Liu, Yanxia
    Liu, Lixin
    Zhao, Haiting
    Zhou, Jinyuan
    Zhang, Zhenxing
    Li, Jian
    Xie, Erqing
    JOURNAL OF MATERIALS RESEARCH, 2011, 26 (01) : 50 - 54
  • [2] Influence of deposition temperature on the structure and optical properties of HfO2 thin films
    Ni J.
    Li Z.-C.
    Zhang Z.-J.
    Frontiers of Materials Science in China, 2008, 2 (4): : 381 - 385
  • [3] Influence of substrate temperature on structural and optical properties of HfO2 thin films
    Zhao H.
    Ma Z.
    Li J.
    Liu L.
    Zhang H.
    Xie Y.
    Su Y.
    Xie E.
    Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams, 2010, 22 (01): : 71 - 74
  • [4] Annealing influence on optical performance of HfO2 thin films
    Khan, Sadaf Bashir
    Zhang, Zhengjun
    Lee, Shern Long
    JOURNAL OF ALLOYS AND COMPOUNDS, 2020, 816 (816)
  • [5] Investigation of thermal annealing effects on microstructural and optical properties of HfO2 thin films
    Modreanu, M.
    Sancho-Parramon, J.
    Durand, O.
    Servet, B.
    Stchakovsky, M.
    Eypert, C.
    Naudin, C.
    Knowles, A.
    Bridou, F.
    Ravet, M. -F.
    APPLIED SURFACE SCIENCE, 2006, 253 (01) : 328 - 334
  • [6] Optical characterization of HfO2 thin films
    Franta, Daniel
    Ohlidal, Ivan
    Necas, David
    Vizda, Frantisek
    Caha, Ondrej
    Hason, Martin
    Pokorny, Pavel
    THIN SOLID FILMS, 2011, 519 (18) : 6085 - 6091
  • [7] HfO2 Thin Films Prepared by Hydrothermal Synthesis
    Shen Jun
    Wang Shengzhao
    Wang Xiaodong
    Zhang Zhihua
    Zhou Bin
    Wu Guangming
    RARE METAL MATERIALS AND ENGINEERING, 2010, 39 : 52 - 56
  • [8] Electrical properties of HfO2 thin insulating film prepared by anodic oxidation
    Yanagisawa, H
    Kamijyo, M
    Shinkai, S
    Sasaki, K
    Abe, Y
    Yamane, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (08): : 5284 - 5287
  • [9] Structure and optical properties of HfO2 thin films on silicon after rapid thermal annealing
    Tan, Tingting
    Liu, Zhengtang
    Lu, Hongcheng
    Liu, Wenting
    Tian, Hao
    OPTICAL MATERIALS, 2010, 32 (03) : 432 - 435
  • [10] Electrical properties of HfO2 thin insulating film prepared by anodic oxidation
    Yanagisawa, H., 1600, Japan Society of Applied Physics (41):