GaAs-based 1.3 µm InGaAs quantum dot lasers: A status report

被引:0
|
作者
M. V. Maximov
N. N. Ledentsov
V. M. Ustinov
Zh. I. Alferov
D. Bimberg
机构
[1] A.F. Ioffe Physical-Technical Institute,Institut für Festkörperphysik
[2] Technische Universität Berlin,undefined
来源
Journal of Electronic Materials | 2000年 / 29卷
关键词
Quantum dot laser; 1.3 µm emitting laser; MOCVD; InGaAs;
D O I
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中图分类号
学科分类号
摘要
We review the present status of InGaAs quantum dot lasers on GaAs sub-strates emitting near and at 1.3 µm. Such lasers are shown to be extremely promising for cost-efficient commercial applications in optical fiber communication. Threshold current densities a low as ∼20 Acm−2 per QD sheet are achieved. Room temperature continuous wave operation at 2.7 W for broad stripe devices is demonstrated. The maximum differential efficiency amounts to 57%. Moreover, single lateral mode continuous wave operation with a maximum output power of 110 mW is realized. Prospects for 1.3 µm GaAs-based vertical cavity surface emitting lasers are given. We also show that the longest wavelength of QD GaAs-based light emitting devices can be potentially extended to 1.7 µm.
引用
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页码:476 / 486
页数:10
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