Transmission electron microscopy study of (103)-oriented epitaxial SrBi2Nb2O9 films grown on (111) SrTiO3 and (111) SrRuO3/(111) SrTiO3

被引:0
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作者
M. A. Zurbuchen
J. Lettieri
Y. Jia
D. G. Schlom
S. K. Streiffer
M. E. Hawley
机构
[1] The Pennsylvania State University,Department of Materials Science and Engineering
[2] Argonne National Laboratory,Materials Science Division
[3] Los Alamos National Laboratory,Materials Science and Technology Division
[4] Augsburg University,Institute of Physics
[5] Qingdao University,undefined
来源
Journal of Materials Research | 2001年 / 16卷
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摘要
Portions of the same epitaxial (103)-oriented SrBi2Nb2O9 film grown on (111) SrTiO3 for which we recently reported the highest remanent polarization (Pr) ever achieved in SrBi2Nb2O9 (or SrBi2Ta2O9) films, i.e., Pr = 15.7 μC/cm2, have been characterized microstructurally by plan-view and cross-sectional transmission electron microscopy (TEM) along three orthogonal viewing directions. SrBi2Nb2O9 grows with its c axis tilted 57° from the substrate surface normal in a three-fold twin structure about the substrate [111], with the growth twins’ c axes nominally aligned with the three 〈100〉 SrTiO3 directions. (103) SrBi2Nb2O9 films with and without an underlying epitaxial SrRuO3 bottom electrode have been studied. Dark-field TEM imaging over a 12 μm2 area shows no evidence of second phases (crystalline or amorphous). A high density of out-of-phase boundaries exists in the films.
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页码:489 / 502
页数:13
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