Hot target magnetron sputtering enhanced by RF-ICP source for CrNx coatings deposition

被引：13

作者：

Grudinin, V. A. ^{[1
]}

Sidelev, D. V. ^{[1
]}

Bleykher, G. A. ^{[1
]}

Yuriev, YuN. ^{[1
]}

Krivobokov, V. P. ^{[1
]}

Berlin, E. V. ^{[2
]}

Grigoriev, V. Yu ^{[2
]}

Obrosov, A. ^{[3
]}

Weiss, S. ^{[3
]}

机构：

[1] Tomsk Polytech Univ, Tomsk 634050, Russia

[2] Lab Vacuum Technol Plus LLC, Moscow 124460, Russia

[3] Brandenburg Tech Univ Cottbus, D-03046 Cottbus, Germany

来源：

VACUUM | 2021年 / 191卷

基金：

俄罗斯科学基金会;

关键词：

CrN coatings; Hot target; Magnetron sputtering; High-rate deposition; RF inductively Coupled plasma; THIN-FILMS; MECHANICAL-PROPERTIES; PLASMA; BIAS; TEMPERATURE; PRESSURE; NITROGEN;

D O I：

10.1016/j.vacuum.2021.110400

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This article describes hot Cr target magnetron sputtering enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source in an Ar + N2 atmosphere. Optical emission spectroscopy revealed an opportunity to perform magnetron sputtering in an inert (Ar) atmosphere, while the CrNx coating can be deposited on a substrate in a chemically reactive atmosphere formed by the RF-ICP source. High stability and repeatability of deposition process were observed, and the deposition rate of the CrNx coatings increased from 106 to 127 nm/ min as N2 flow rate rose. The power of the RF-ICP source and the N2 flow rate can be used to tailor and control deposition conditions. The XRD and WDS measurements showed the effect of deposition conditions on the crystal structure and elemental composition of CrNx coatings. It was found that the change of substrate bias, RF-ICP source power and N2 flow rate result in variation of coating stoichiometry from pure Cr to CrN.

引用

页数：9

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