X-ray nanodiffraction at individual SiGe/Si(001) dot molecules and its numerical description based on kinematical scattering theory

被引:10
作者
Dubslaff, M. [1 ]
Hanke, M. [1 ]
Schoeder, S. [2 ]
Burghammer, M. [2 ]
Boeck, T. [3 ]
Patommel, J. [4 ]
机构
[1] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
[2] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[3] Leibniz Inst Kristallzuchtung, D-12489 Berlin, Germany
[4] Tech Univ Dresden, Inst Strukturphys, D-01069 Dresden, Germany
关键词
elemental semiconductors; Ge-Si alloys; semiconductor quantum dots; silicon; X-ray diffraction; REFRACTIVE LENSES;
D O I
10.1063/1.3373916
中图分类号
O59 [应用物理学];
学科分类号
摘要
Individual self-assembled SiGe/Si(001) dot molecules were investigated by scanning x-ray nanodiffraction with a beam size of 250 nm in diameter (full width at half maximum). The samples contain dot molecules with either one, two, three, or four dots. Different azimuthal configurations were measured and compared with simulated diffraction patterns. We have combined finite element calculations, kinematic scattering simulations, and experimental measurements to obtain information about lateral positional correlation as well as strain and germanium content within individual dot molecules.
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页数:3
相关论文
共 15 条
[1]   Wet etching of linear Fresnel zone plates for hard X-rays [J].
David, C ;
Nöhammer, B ;
Ziegler, E .
MICROELECTRONIC ENGINEERING, 2002, 61-2 :987-992
[2]  
DAVYDOK A, 2009, J SYNCHROTRON RADIAT, V16, P1704
[3]   Dedicated fabrication of silicon-based ensembles of dot molecules with a specific and unique number of dots [J].
Hanke, M ;
Boeck, T ;
Gerlitzke, AK ;
Syrowatka, F ;
Heyroth, F .
APPLIED PHYSICS LETTERS, 2006, 88 (06)
[4]   Scanning x-ray diffraction with 200 nm spatial resolution [J].
Hanke, M. ;
Dubslaff, M. ;
Schmidbauer, M. ;
Boeck, T. ;
Schoeder, S. ;
Burghammer, M. ;
Riekel, C. ;
Patommel, J. ;
Schroer, C. G. .
APPLIED PHYSICS LETTERS, 2008, 92 (19)
[5]  
HANKE M, 1959, J APPL PHYS, V96, P2004
[6]   Imaging by parabolic refractive lenses in the hard X-ray range [J].
Lengeler, B ;
Schroer, C ;
Tümmler, J ;
Benner, B ;
Richwin, M ;
Snigirev, A ;
Snigireva, I ;
Drakopoulos, M .
JOURNAL OF SYNCHROTRON RADIATION, 1999, 6 :1153-1167
[7]   Beyond the ensemble average: X-ray microdiffraction analysis of single SiGe islands [J].
Mocuta, C. ;
Stangl, J. ;
Mundboth, K. ;
Metzger, T. H. ;
Bauer, G. ;
Vartanyants, I. A. ;
Schmidbauer, M. ;
Boeck, T. .
PHYSICAL REVIEW B, 2008, 77 (24)
[8]   Nanometer focusing properties of Fresnel zone plates described by dynamical diffraction theory [J].
Pfeiffer, F. ;
David, C. ;
van der Veen, J. F. ;
Bergemann, C. .
PHYSICAL REVIEW B, 2006, 73 (24)
[9]   Probing the elastic properties of individual nanostructures by combining in situ atomic force microscopy and micro-x-ray diffraction [J].
Scheler, T. ;
Rodrigues, M. ;
Cornelius, T. W. ;
Mocuta, C. ;
Malachias, A. ;
Magalhaes-Paniago, R. ;
Comin, F. ;
Chevrier, J. ;
Metzger, T. H. .
APPLIED PHYSICS LETTERS, 2009, 94 (02)
[10]   Hard x-ray nanoprobe based on refractive x-ray lenses -: art. no. 124103 [J].
Schroer, CG ;
Kurapova, O ;
Patommel, J ;
Boye, P ;
Feldkamp, J ;
Lengeler, B ;
Burghammer, M ;
Riekel, C ;
Vincze, L ;
van der Hart, A ;
Küchler, M .
APPLIED PHYSICS LETTERS, 2005, 87 (12) :1-3