The growth of Pd thin films on a 6H-SiC(0001) substrate

被引:9
|
作者
Tsiaoussis, I.
Frangis, N. [1 ]
Manolikas, C.
Tan, T. A. Nguyen
机构
[1] Aristotle Univ Thessaloniki, Dept Phys, Solid State Phys Sect, GR-54124 Thessaloniki, Greece
[2] CNRS, LEPES, F-38042 Grenoble 9, France
关键词
microscopy; twins; epitaxy; Pd; SiC; metallic contacts;
D O I
10.1016/j.jcrysgro.2006.12.036
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Pd thin films, grown on Si-rich 6H-SiC(0 0 0 1) substrates, were studied by atomic force microscopy, electron diffraction and high-resolution transmission electron microscopy. It is concluded that the growth is successful only when all the growth process takes place at room temperature. Under these conditions a very good epitaxial growth of Pd is achieved, despite the large misfit (about 8.6%) between Pd and the substrate and the existence of a semi-amorphous layer between the thin film and the substrate. A large number of twins appear in these films. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:368 / 373
页数:6
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