Hydrophobic to superhydrophobic and hydrophilic transitions of Ar plasma-nanostructured PTFE surfaces

被引:11
|
作者
Pachchigar, Vivek [1 ,2 ]
Gaur, Umesh K. [1 ]
Amrutha, T., V [3 ]
Sooraj, K. P. [1 ]
Hans, Sukriti [2 ]
Srivastava, Sanjeev K. [4 ]
Ranjan, Mukesh [1 ,2 ]
机构
[1] Inst Plasma Res, Plasma Surface Engn Div, Gandhinagar, Gujarat, India
[2] Homi Bhabha Natl Inst, Mumbai, Maharashtra, India
[3] Kadi Sarva Vishvavidyalaya, Dept Phys, Gandhinagar, Gujarat, India
[4] Indian Inst Technol Kharagpur, Dept Phys, Kharagpur, W Bengal, India
关键词
Ar plasma; plasma etching; PTFE; RF discharge; superhydrophobic surfaces; CROSS-LINKING; POLYTETRAFLUOROETHYLENE PTFE; POLYMERS; ADHESION; ARGON; FILMS; AIR; PROTRUSIONS; PERFORMANCE; SPECTRA;
D O I
10.1002/ppap.202200037
中图分类号
O59 [应用物理学];
学科分类号
摘要
Production of superhydrophobic polytetrafluoroethylene (PTFE) by Ar plasma etching is challenging as it leads to defluorination, resulting in a hydrophilic surface. The effect of radiofrequency power, treatment time, impurity, and surface temperature on Ar plasma-treated PTFE was investigated for producing a large-area superhydrophobic PTFE surface. To avoid impurity and substrate temperature effects, a single electrode-based arrangement with a sacrificial PTFE disc behind the specimen was used for plasma discharge. After 5 min treatment at 100 W, the surface became superhydrophobic (water contact angle = 156 degrees) due to the formation of isotropic nanostructures. However, 30 min of plasma treatment caused severe chemical changes resulting in a hydrophilic surface (water contact angle = 14 degrees). A yellowish layer was formed on the surface due to crosslinking, redeposition of fluorocarbon species, and iron impurities from the plasma system confirmed by X-ray photoelectron spectroscopy analysis.
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页数:14
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