Interferometry for ellipso-height-topometry Part 2: Measurement of the ellipsometric data, material identification, and correction of the measured height

Ellipso-height-topometry, EHT, as introduced by Leonhardt, et al. [Interferometry for ellipso-height-topometry, part 1, Optik 113 (2003) 513-519; Topometry for locally changing materials, Opt. Lett. 23 (1998) 1772-1774]; [Ellipso-height topometry, Optik 112 (2001) 413-420] is an extended topometry where topographies of the surface height H(x,y), the ellipsometric parameters Psi(x,y) and Delta(x,y) (and optionally the intensity distribution I(x,y)) of the surface are measured on the same pixel raster and with high resolution. Thus, we can dispose over a set of (mutually coherent) topographies, and further topographies of quantities of interest can be calculated from this set: the local change in the complex refractive index N(x,y) = n(x,y) k(x,y)i of bulk surfaces, the thickness distribution t(x,y) of locally changing (discontinuous) films and overlayers, and a correction of the optically measured local height H(x,y). The height error Delta H(x,y) can be calculated from the ellipsometric data and the true height h(x,y) = H(x,y)-Delta H(x,y) is thus obtained. Delta H(x,y) can assume large values when overlayers of oxidations or residues from lubrication oil or from processing are present. Much more information about the surface is gained with this concept. In part 1 of this work a z-scanning interferometric scheme with oblique incidence over the entire object field has been introduced, with the advantages of white-light interferometry, but with the additional capability of measuring material information to supply a complete set of topographies for extended topometry. In addition, very useful coherence properties for interferometry with oblique incidence were presented and discussed which allow to shape the interferogram in a simple way without any additional devices. In this part we derive the theory of the ellipsometric measurement and present first results by complete sets of two different samples. (C) 2009 Elsevier GmbH. All rights reserved.