Digital holographic reflectometry

被引：39

作者：

Colomb, Tristan ^{[1
]}

Krivec, Stefan ^{[2
,3
]}

Hutter, Herbert ^{[2
]}

Akatay, Ahmet Ata ^{[4
]}

Pavillon, Nicolas ^{[4
]}

Montfort, Frederic ^{[1
]}

Cuche, Etienne ^{[1
]}

Kuehn, Jonas ^{[5
]}

Depeursinge, Christian ^{[4
]}

Emery, Yves ^{[1
]}

机构：

[1] Lyncee Tec SA, PSE A, CH-1015 Lausanne, Switzerland

[2] KAI Kompetenzzentrum Automobil & Ind Elekt, A-9524 Villach, Austria

[3] Vienna Univ Technol, Inst Chem Technol & Analyt, A-1060 Vienna, Austria

[4] Ecole Polytech Fed Lausanne, Adv Photon Lab, CH-1015 Lausanne, Switzerland

[5] DP CHUV, CH-1008 Prilly, Switzerland

来源：

OPTICS EXPRESS | 2010年 / 18卷 / 04期

关键词：

PHASE-CONTRAST MICROSCOPY; REFRACTIVE-INDEX; INTERFEROMETRY; COMPENSATION; SIMS;

D O I：

10.1364/OE.18.003719

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Digital holographic microscopy (DHM) is an interferometric technique that allows real-time imaging of the entire complex optical wave-front (amplitude and phase) reflected by or transmitted through a sample. To our knowledge, only the quantitative phase is exploited to measure topography, assuming homogeneous material sample and a single reflection on the surface of the sample. In this paper, dual-wavelength DHM measurements are interpreted using a model of reflected wave propagation through a three-interfaces specimen (2 layers deposited on a semi-infinite layer), to measure simultaneously topography, layer thicknesses and refractive indices of micro-structures. We demonstrate this DHM reflectometry technique by comparing DHM and profilometer measurement of home-made SiO2/Si targets and Secondary Ion Mass Spectrometry (SIMS) sputter craters on specimen including different multiple layers. (C) 2010 Optical Society of America

引用

页码：3719 / 3731

页数：13

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